Field-assisted oxidation of rhodium
- Author(s)
- Jean-Sabin Mc Ewen, P. Gaspard, Florian Mittendorfer, Thierry Visart de Bocarme, Norbert Kruse
- Abstract
The oxidation of nanosized rhodium facets is investigated in the presence of a high external electric field with field ion microscopy experiments (FIM). Corresponding density functional theory (DFT) calculations were done on Rh(0 0 1), Rh(0 1 1) and Rh(1 1 1). A cross-like granular structure is obtained with FIM when the electric field is increased from 11 to 12.3 V/nm, which strongly indicates that the field promotes the oxidation of the tip. The DFT calculations confirm this scenario with a corresponding reduction of the activation barrier for oxygen incorporation into the surface of an oxide layer. © 2007 Elsevier B.V. All rights reserved
- Organisation(s)
- Computational Materials Physics
- External organisation(s)
- Vrije Universiteit Brussel
- Journal
- Chemical Physics Letters
- Volume
- 452
- Pages
- 133-138
- No. of pages
- 6
- ISSN
- 0009-2614
- DOI
- https://doi.org/10.1016/j.cplett.2007.12.031
- Publication date
- 2008
- Peer reviewed
- Yes
- Austrian Fields of Science 2012
- 1030 Physics, Astronomy
- Portal url
- https://ucrisportal.univie.ac.at/en/publications/fieldassisted-oxidation-of-rhodium(00dc145c-ab68-423a-bf86-ca44ff0ecb0e).html